Write Field Extension
Write Field Extension- the benefits
For mastering lens arrays
Adaptable for any design due to software defined additive fabrication
Flexibility to support freeform optics designs
Stitchless printing of large micro lens arrays
Scaling from low-volume prototyping up to high-volume mass production
Fabricate micro lens arrays for mastering
Write Field Extension- the process
Step 1: Drop dispense photoresist
Step 2: Automatic nanofabrication of micro optical elments
Step 3: Post development steps and cleaning of the assembly
Wavelength compatibility 530 nm to 1650 nm
Compatible with a wide range of material platforms: silicon on insulator, silicon nitride, thin film lithium niobate (TFLN), indium phosphide, and more.
Refractive Index @ 1550 nm: 1.53
Operational range 530 nm to 2000 nm
Material absorption negligible
Below σ = 50 nm detection accuracy
Below ±100 nm shape accuracy
Less than 10 nm RMS-roughness